Keywords : Chemical Vapor Deposition – Atomic Layer Deposition – Thin films – Process modelling
Current reasearch activities concern Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) processes. The substrates to coat can be either planar or complex, including powders using fluidized bed reactors. The aim is to correlate the synthesis conditions to the characteristics and properties of the deposited materials, by combining experimental studies on lab-scale equipments and numerical modelling works at the process scale. The mechanisms involved in the process (gas phase transport phenomena, homogeneous chemical reactions) and on the coating surface (heterogeneous chemical reactions, nucleation, growth, solid diffusion) are finely analysed. These activities are conducted in the frame of collaborations with complementary labs and with industrial companies. Deposited materials recently or currently under scope include oxides (Al2O3, SiO2, …), metals and metalloids (Cu, Fe, Si, …) and graphene.
Application & Teaching
Research interest: Frequently studied questions concern the optimisation of the deposit uniformity in thickness, morphology, microstructure and chemical composition on large or complex substrates, and the analysis of the mechanisms involved in the formation of the substrate/coating interfacial zone.
Applications : Anti-corrosion coatings – Thermal barrier coatings – Green energy – Catalysis – Microelectronics – Micro-sensors
PhD students in recent years: N. Coppey (2013) – P. Trinsoutrot (2014) – P.L. Etchepare (2015) – F. Vanni (2015) – P. Lassègue (2016) – S. Ponton (2016-2019) – G. Gakis (2016-2019) – M. Mirabedin (2017-2020) – K. Topka (2018-2021)
Teaching activities at ENSIACET and ENSAT: Transport phenomena (L3, M1, M2 levels) – HSE (L3 and M1) – Thin film deposition engineering (M2)
Responsible for the 3rd year parcours Fonctionnalité (pôle Matériaux Innovants) of ENSIACET and correspondent for Toulouse INP ENSIACET of the Master 2 Génie des Procédés et Bioprocédés, parcours PCE2 (Procédés pour la Chimie, l’Energie et l’Environnement)
Research collaborators: J. Compain, H. Vergnes (LGC) – D. Samelor, D. Sadowski, N. Caussé, C. Vahlas (CIRIMAT) – E. Scheid (LAAS) – M. Monthioux (CEMES) – A. Boudouvis (NTUA Greece)